Invention Grant
- Patent Title: Exposure apparatus, exposure method, and device manufacturing method
- Patent Title (中): 曝光装置，曝光方法和装置制造方法
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Application No.: US11887584Application Date: 2006-04-17
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Publication No.: US08089608B2Publication Date: 2012-01-03
- Inventor: Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
- Applicant: Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-120185 20050418
- International Application: PCT/JP2006/308040 WO 20060417
- International Announcement: WO2006/112436 WO 20061026
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/52
Abstract:
An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.
Public/Granted literature
- US20090115977A1 Exposure Apparatus, Exposure Method, and Device Manufacturing Method Public/Granted day:2009-05-07
Information query
