Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US12232902Application Date: 2008-09-25
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Publication No.: US08089609B2Publication Date: 2012-01-03
- Inventor: Harry Sewell , Justin L. Kreuzer
- Applicant: Harry Sewell , Justin L. Kreuzer
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A lithographic apparatus comprises an immersion fluid system and an interferometric temperature detection system. The immersion fluid system is configured to provide immersion fluid to an exposure system. The interferometric temperature detection system is configured to measure a temperature of the immersion fluid.
Public/Granted literature
- US20090109412A1 Lithographic apparatus and device manufacturing method Public/Granted day:2009-04-30
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