Invention Grant
- Patent Title: Optical element and method of calibrating a measuring apparatus comprising a wave shaping structure
- Patent Title (中): 光学元件和校准包括波形整形结构的测量装置的方法
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Application No.: US12684632Application Date: 2010-01-08
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Publication No.: US08089634B2Publication Date: 2012-01-03
- Inventor: Jochen Hetzler , Frank Schillke , Stefan Schulte , Rolf Freimann , Bernd Doerband
- Applicant: Jochen Hetzler , Frank Schillke , Stefan Schulte , Rolf Freimann , Bernd Doerband
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Sughrue Mion, PLLC
- Priority: EPPCT/EP2007/006069 20070709; EPPCT/EP2007/006639 20070726
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G01B11/02
Abstract:
Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.
Public/Granted literature
- US20100177321A1 OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COMPRISING A WAVE SHAPING STRUCTURE Public/Granted day:2010-07-15
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