Invention Grant
- Patent Title: Semiconductor memory device and method of forming the same
- Patent Title (中): 半导体存储器件及其形成方法
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Application No.: US12285619Application Date: 2008-10-09
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Publication No.: US08089801B2Publication Date: 2012-01-03
- Inventor: Peng-Fei Wang , Yi Gong
- Applicant: Peng-Fei Wang , Yi Gong
- Applicant Address: CN Suzhou
- Assignee: Suzhou Oriental Semiconductor Co., Ltd.
- Current Assignee: Suzhou Oriental Semiconductor Co., Ltd.
- Current Assignee Address: CN Suzhou
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: CN200810043070 20080123
- Main IPC: G11C11/24
- IPC: G11C11/24

Abstract:
The present invention discloses a semiconductor memory device comprising a source, a drain, a floating gate, a control gate, a recess channel and a gated p-n diode. The said p-n diode connects said floating gate and said drain. The said floating gate is for charge storage purpose, it can be electrically charged or discharged by current flowing through the gated p-n diode. An array of memory cells formed by the disclosed semiconductor memory device is proposed. Furthermore, an operating method and a method for producing the disclosed semiconductor memory device and array are described.
Public/Granted literature
- US20090185426A1 Semiconductor memory device and method of forming the same Public/Granted day:2009-07-23
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