Invention Grant
- Patent Title: Apparatus including defect correcting system which repeats a correcting of a reticle pattern defect and a correcting method using the apparatus
- Patent Title (中): 包括重复校正光罩图案缺陷的缺陷校正系统和使用该装置的校正方法的装置
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Application No.: US11878574Application Date: 2007-07-25
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Publication No.: US08090188B2Publication Date: 2012-01-03
- Inventor: Masahito Hiroshima
- Applicant: Masahito Hiroshima
- Applicant Address: JP Chuo-ku, Tokyo
- Assignee: Elpida Memory, Inc.
- Current Assignee: Elpida Memory, Inc.
- Current Assignee Address: JP Chuo-ku, Tokyo
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2006-203464 20060726
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G01N21/00 ; H04N9/47 ; H04N7/18 ; G06F17/50
Abstract:
A reticle pattern defect correcting apparatus comprises a lithographic emulation system including an optical emulation system and a micromachining defect correcting system including a reticle defect correcting mechanism with a cantilever. Since correction of a reticle pattern defect is carried out while the transferred image is being observed in real time by the optical emulation system, it is possible to achieve an efficient reticle pattern correction while avoiding overcorrection and other problems.
Public/Granted literature
- US20080050010A1 Apparatus for correcting defects in a reticle pattern and correcting method for the same Public/Granted day:2008-02-28
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