Invention Grant
- Patent Title: Optical parametric model optimization
- Patent Title (中): 光参数模型优化
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Application No.: US12477459Application Date: 2009-06-03
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Publication No.: US08090558B1Publication Date: 2012-01-03
- Inventor: Thaddeus G. Dziura
- Applicant: Thaddeus G. Dziura
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Luedeka, Neely & Graham, P.C.
- Main IPC: G06F7/60
- IPC: G06F7/60 ; G06F3/00 ; G06G7/48 ; G01J3/40 ; G01J3/42 ; G06E3/00 ; G01R27/28 ; G01B5/02

Abstract:
A method is presented for selecting the order in which parameters are evaluated for inclusion in a model of a film stack, which is by ranking them according to measurement precision. Further, a method is presented for determining which parameters are to be floated, set, or discarded from the model, which is by determining whether average chi-square and chi-square uniformity decreases or increases when the parameter is added to the model. In this manner, a model for the film stack can be quickly assembles with a high degree of accuracy.
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