Invention Grant
US08092704B2 System, method and apparatus for fabricating a c-aperture or E-antenna plasmonic near field source for thermal assisted recording applications 有权
用于制造用于热辅助记录应用的c-孔径或E-天线等离子体近场源的系统,方法和装置

System, method and apparatus for fabricating a c-aperture or E-antenna plasmonic near field source for thermal assisted recording applications
Abstract:
A method of fabricating a c-aperture or E-antenna plasmonic near field source for thermal assisted recording applications in hard disk drives is disclosed. A c-aperture or E-antenna is built for recording head applications. The technique employs e-beam lithography, partial reactive ion etching and metal refill to build the c-apertures. This process strategy has the advantage over other techniques in the self-alignment of the c-aperture notch to the c-aperture internal diameter, the small number of process steps required, and the precise and consistent shape of the c-aperture notch itself.
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