Invention Grant
US08092760B2 Scanning arm for semiconductor wafer pollutant measurement apparatus and scanning device using the same 有权
半导体晶片污染物测量装置的扫描臂及使用其的扫描装置

  • Patent Title: Scanning arm for semiconductor wafer pollutant measurement apparatus and scanning device using the same
  • Patent Title (中): 半导体晶片污染物测量装置的扫描臂及使用其的扫描装置
  • Application No.: US12206128
    Application Date: 2008-09-08
  • Publication No.: US08092760B2
    Publication Date: 2012-01-10
  • Inventor: Ho Jin KimHyoung Bae Kim
  • Applicant: Ho Jin KimHyoung Bae Kim
  • Applicant Address: KR Gyeonggi-Do, Gwangju-Si
  • Assignee: Korea Techno Co., Ltd
  • Current Assignee: Korea Techno Co., Ltd
  • Current Assignee Address: KR Gyeonggi-Do, Gwangju-Si
  • Agency: Lexyoume IP Group
  • Priority: KR10-2008-0031129 20080403
  • Main IPC: B08B3/04
  • IPC: B08B3/04
Scanning arm for semiconductor wafer pollutant measurement apparatus and scanning device using the same
Abstract:
Provided is a scanning arm which moves to collect pollutants on the surface of a semiconductor wafer, for use in a semiconductor wafer pollutant measurement apparatus, and a scanning device using the same. The scanning arm includes: an X-axis portion; a Z-axis portion which is perpendicularly installed with the X-axis portion so as to move forward and backward along the X-axis portion; and a Y-axis portion which is perpendicularly installed with the Z-axis portion so as to move up and down with respect to the Z-axis portion.
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