Invention Grant
US08092760B2 Scanning arm for semiconductor wafer pollutant measurement apparatus and scanning device using the same
有权
半导体晶片污染物测量装置的扫描臂及使用其的扫描装置
- Patent Title: Scanning arm for semiconductor wafer pollutant measurement apparatus and scanning device using the same
- Patent Title (中): 半导体晶片污染物测量装置的扫描臂及使用其的扫描装置
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Application No.: US12206128Application Date: 2008-09-08
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Publication No.: US08092760B2Publication Date: 2012-01-10
- Inventor: Ho Jin Kim , Hyoung Bae Kim
- Applicant: Ho Jin Kim , Hyoung Bae Kim
- Applicant Address: KR Gyeonggi-Do, Gwangju-Si
- Assignee: Korea Techno Co., Ltd
- Current Assignee: Korea Techno Co., Ltd
- Current Assignee Address: KR Gyeonggi-Do, Gwangju-Si
- Agency: Lexyoume IP Group
- Priority: KR10-2008-0031129 20080403
- Main IPC: B08B3/04
- IPC: B08B3/04

Abstract:
Provided is a scanning arm which moves to collect pollutants on the surface of a semiconductor wafer, for use in a semiconductor wafer pollutant measurement apparatus, and a scanning device using the same. The scanning arm includes: an X-axis portion; a Z-axis portion which is perpendicularly installed with the X-axis portion so as to move forward and backward along the X-axis portion; and a Y-axis portion which is perpendicularly installed with the Z-axis portion so as to move up and down with respect to the Z-axis portion.
Public/Granted literature
- US20090249896A1 SCANNING ARM FOR SEMICONDUCTOR WAFER POLLUTANT MEASUREMENT APPARATUS AND SCANNING DEVICE USING THE SAME Public/Granted day:2009-10-08
Information query
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