Invention Grant
- Patent Title: Corrosion resistant spacer
- Patent Title (中): 耐腐蚀间隔物
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Application No.: US11954439Application Date: 2007-12-12
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Publication No.: US08092923B2Publication Date: 2012-01-10
- Inventor: Sunil K. Thamida
- Applicant: Sunil K. Thamida
- Applicant Address: US MI Detroit
- Assignee: GM Global Technology Operations LLC
- Current Assignee: GM Global Technology Operations LLC
- Current Assignee Address: US MI Detroit
- Main IPC: B32B15/04
- IPC: B32B15/04

Abstract:
An interface device is provided that is insertable at a junction between a first device comprising a first metal and a second device comprising a second metal that is dissimilar to the first metal. The interface device comprises at least one layer comprising an alloy of the first metal and the second metal and having a functionally gradient composition operative to reduce a galvanic effect between the first and second devices.
Public/Granted literature
- US20090155616A1 CORROSION RESISTANT SPACER Public/Granted day:2009-06-18
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