Invention Grant
- Patent Title: Stressed thin-film membrane islands
- Patent Title (中): 强调薄膜膜岛
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Application No.: US12397764Application Date: 2009-03-04
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Publication No.: US08092944B2Publication Date: 2012-01-10
- Inventor: Samuel B. Schaevitz , Aleksander Franz , Roger W. Barton
- Applicant: Samuel B. Schaevitz , Aleksander Franz , Roger W. Barton
- Applicant Address: US MA Wilmington
- Assignee: Lilliputian Systems, Inc.
- Current Assignee: Lilliputian Systems, Inc.
- Current Assignee Address: US MA Wilmington
- Agency: Sunstein Kann Murphy & Timbers LLP
- Main IPC: H01M8/00
- IPC: H01M8/00 ; H01M8/10

Abstract:
A structure including a support defining an opening, and a tensilely stressed thin-film membrane disposed to occlude the opening, the membrane contacting at least a portion of the support. The stressed membrane includes a material having a characteristic crack spacing greater than one-half of a minimum dimension of the membrane and less than ten times the minimum dimension. A structure including a support defining a opening having a minimum opening dimension, and a compressively stressed thin-film membrane disposed to occlude the opening, the membrane contacting at least a portion of the support. The stressed membrane includes a membrane material having a critical aspect ratio for buckling that is greater than a ratio of one-half of the minimum opening dimension to a thickness of the membrane, and the critical aspect ratio for buckling is less than a ratio of ten times the minimum opening dimension to the thickness of the membrane.
Public/Granted literature
- US20100003575A1 STRESSED THIN-FILM MEMBRANE ISLANDS Public/Granted day:2010-01-07
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