Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
-
Application No.: US12205973Application Date: 2008-09-08
-
Publication No.: US08093660B2Publication Date: 2012-01-10
- Inventor: Tomohide Terashima
- Applicant: Tomohide Terashima
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-142511 20080530
- Main IPC: H01L27/06
- IPC: H01L27/06

Abstract:
A voltage mitigating element mitigating a voltage applied across a gate insulating film in an off state of an insulated gate bipolar transistor (IGBT) is arranged to a gate electrode node of a P-channel MOS transistor provided for suppressing flow-in of holes at the time of turn-off of the IGBT. Withstanding voltage characteristics are improved and an occupation area thereof is reduced while maintaining switching characteristics and a low on-resistance of an insulated gate bipolar transistor.
Public/Granted literature
- US20090294799A1 SEMICONDUCTOR DEVICE Public/Granted day:2009-12-03
Information query
IPC分类: