Invention Grant
- Patent Title: Magnetoresistance device
- Patent Title (中): 磁阻装置
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Application No.: US12390547Application Date: 2009-02-23
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Publication No.: US08094417B2Publication Date: 2012-01-10
- Inventor: Susumu Ogawa , Andrew Troup , David Williams , Hiroshi Fukuda
- Applicant: Susumu Ogawa , Andrew Troup , David Williams , Hiroshi Fukuda
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: EP08157888 20080609
- Main IPC: G11B5/33
- IPC: G11B5/33

Abstract:
A magnetoresistance device has a channel extending between first and second ends in a first direction comprising non-ferromagnetic semiconducting material, such as silicon, a plurality of leads connected to and spaced apart along the channel, a gate structure for applying an electric field to the channel in a second direction which is substantially perpendicular to the first direction so as to form an inversion layer in the channel and a face which lies substantially in a plane defined by the first and second directions and which is configured such that an edge of the channel runs along the face.
Public/Granted literature
- US20090303638A1 MAGNETORESISTANCE DEVICE Public/Granted day:2009-12-10
Information query
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