Invention Grant
US08094783B2 Method and system for performing materials analysis with reflected inelastic scatter
失效
用反射的非弹性散射进行材料分析的方法和系统
- Patent Title: Method and system for performing materials analysis with reflected inelastic scatter
- Patent Title (中): 用反射的非弹性散射进行材料分析的方法和系统
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Application No.: US12572934Application Date: 2009-10-02
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Publication No.: US08094783B2Publication Date: 2012-01-10
- Inventor: Geoffrey Harding
- Applicant: Geoffrey Harding
- Applicant Address: US CA Newark
- Assignee: Morpho Detection, Inc.
- Current Assignee: Morpho Detection, Inc.
- Current Assignee Address: US CA Newark
- Agency: Armstrong Teasdale LLP
- Main IPC: G01N23/20
- IPC: G01N23/20

Abstract:
A method for performing materials analysis of an object using an X-ray system includes generating an X-ray beam using an X-ray source having an anode and acquiring a scatter spectrum from Compton scatter produced when the X-ray beam interacts with the object. The scatter spectrum is acquired using an energy resolving detector. A Compton profile is extracted from the scatter spectrum by processing the scatter spectrum using a control system of the X-ray system. The Compton profile includes peaks at characteristic lines of the anode. The method further includes identifying a characteristic of a material of the object using the Compton profile, and outputting an indication of the characteristic of the material.
Public/Granted literature
- US20110081003A1 METHOD AND SYSTEM FOR PERFORMING MATERIALS ANALYSIS WITH REFLECTED INELASTIC SCATTER Public/Granted day:2011-04-07
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