Invention Grant
US08094783B2 Method and system for performing materials analysis with reflected inelastic scatter 失效
用反射的非弹性散射进行材料分析的方法和系统

Method and system for performing materials analysis with reflected inelastic scatter
Abstract:
A method for performing materials analysis of an object using an X-ray system includes generating an X-ray beam using an X-ray source having an anode and acquiring a scatter spectrum from Compton scatter produced when the X-ray beam interacts with the object. The scatter spectrum is acquired using an energy resolving detector. A Compton profile is extracted from the scatter spectrum by processing the scatter spectrum using a control system of the X-ray system. The Compton profile includes peaks at characteristic lines of the anode. The method further includes identifying a characteristic of a material of the object using the Compton profile, and outputting an indication of the characteristic of the material.
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