Invention Grant
US08096744B2 Wafer processing system, wafer processing method, and ion implantation system
有权
晶圆处理系统,晶圆加工方法和离子注入系统
- Patent Title: Wafer processing system, wafer processing method, and ion implantation system
- Patent Title (中): 晶圆处理系统,晶圆加工方法和离子注入系统
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Application No.: US11254854Application Date: 2005-10-21
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Publication No.: US08096744B2Publication Date: 2012-01-17
- Inventor: Keiji Okada , Fumiaki Sato , Hiroaki Nakaoka
- Applicant: Keiji Okada , Fumiaki Sato , Hiroaki Nakaoka
- Applicant Address: JP Tokyo
- Assignee: Sen Corporation, An Shi and Axcelis Company
- Current Assignee: Sen Corporation, An Shi and Axcelis Company
- Current Assignee Address: JP Tokyo
- Agency: Arent Fox, LLP
- Priority: JP2004-346170 20041130
- Main IPC: H01L21/677
- IPC: H01L21/677

Abstract:
Two load lock chambers having a load lock pedestal are provided adjacent to a vacuum process chamber through a vacuum intermediate chamber. A passage opening is provided between the vacuum process chamber and the vacuum intermediate chamber. Two wafer retaining arms are installed between a platen device in the vacuum process chamber and the vacuum intermediate chamber. The two wafer retaining arms are reciprocatingly movable between the corresponding load lock pedestals and the platen device while passing through the passage opening and crossing with an overpass each other at different levels. By retaining an unprocessed wafer by one of the wafer retaining arms and retaining a processed wafer by the other wafer retaining arm, transfer of the unprocessed wafer from one of the load lock pedestals to the platen device and transfer of the processed wafer from the platen device to the other load lock pedestal are performed simultaneously.
Public/Granted literature
- US20060182532A1 Wafer processing system, wafer processing method, and ion implantation system Public/Granted day:2006-08-17
Information query
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