Invention Grant
- Patent Title: Polishing pad conditioner
- Patent Title (中): 抛光垫调理剂
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Application No.: US11992327Application Date: 2006-08-17
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Publication No.: US08096858B2Publication Date: 2012-01-17
- Inventor: Hiroaki Sakamoto , Toshiya Kinoshita
- Applicant: Hiroaki Sakamoto , Toshiya Kinoshita
- Applicant Address: JP Tokyo
- Assignee: Nippon Steel Materials Co., Ltd.
- Current Assignee: Nippon Steel Materials Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Kenyon & Kenyon LLP
- Priority: JP2005-276376 20050922
- International Application: PCT/JP2006/316536 WO 20060817
- International Announcement: WO2007/034646 WO 20070329
- Main IPC: B24B21/18
- IPC: B24B21/18

Abstract:
The invention provides a polishing pad conditioner that enables stabilization of brazing metal melting point, minimization of abrasive grain detachment by uniformizing and stabilizing abrasive grain brazing condition, and enhancement of flatness by minimizing thermal deformation of the metal support. The polishing pad conditioner is fabricated by brazing multiple abrasive grains to the surface of a metal support with brazing metal, wherein the composition of the brazing metal expressed in mass % is such that 70%≦Ni+Fe≦90% (provided that 0≦Fe/(Ni+Fe)≦0.4), 1%≦Cr≦25%, 2%≦Si+B≦15% (provided that 0≦B/(Si+B)≦0.8), and 0.1%≦P≦8%.
Public/Granted literature
- US20090275274A1 Polishing Pad Conditioner Public/Granted day:2009-11-05
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