Invention Grant
- Patent Title: Systems and methods for in situ assembly of an interspinous process distraction implant
- Patent Title (中): 椎间盘突出植入物的原位组装的系统和方法
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Application No.: US11874853Application Date: 2007-10-18
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Publication No.: US08097019B2Publication Date: 2012-01-17
- Inventor: Steven T. Mitchell , Charles J. Winslow , Scott A. Yerby
- Applicant: Steven T. Mitchell , Charles J. Winslow , Scott A. Yerby
- Applicant Address: CH Neuchatel
- Assignee: Kyphon SARL
- Current Assignee: Kyphon SARL
- Current Assignee Address: CH Neuchatel
- Main IPC: A61F2/44
- IPC: A61F2/44

Abstract:
An implant system for implantation between adjacent spinous processes for the relief of pain associated with the spine. The implant has a series of spacers which may be inserted over a shaft located between adjacent spinous processes thus allowing the implant to be assembled in situ. The spacers may rotate on the shaft relative to the wings. To minimize trauma to the patient, each spacer has a tapered tissue expander to distract the opening between the spinous processes during assembly. The shaft is connected to a wing, and a second wing or deployable wing may be inserted over the shaft and locked into place.
Public/Granted literature
- US20080177391A1 Systems and Methods for In Situ Assembly of an Interspinous Process Distraction Implant Public/Granted day:2008-07-24
Information query
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