Invention Grant
- Patent Title: Evacuable magnetron chamber
- Patent Title (中): 可抽出的磁控管室
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Application No.: US11184679Application Date: 2005-07-19
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Publication No.: US08097133B2Publication Date: 2012-01-17
- Inventor: Makoto Inagawa
- Applicant: Makoto Inagawa
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: C23C14/54
- IPC: C23C14/54

Abstract:
A vacuum pumping system and method in conjunction with a sputter reactor having a vacuum-pumped magnetron chamber sealed to the target backing plate. A main sputter chamber is vacuum sealed to the target front and cryo pumped. A bypass conduit and valve connect the magnetron and main chambers. A mechanical roughing pump connected to the magnetron chamber pumps the main chamber through the bypass conduit to less than 1 Torr before the bypass valve is closed and the cryo pump is opened and thereafter continues to pump the magnetron chamber to reduce the pressure differential across the target. A pressure differential switch connected across the bypass valve immediately open it whenever the pressure differential exceeds a limit, such as 20 Torr, for example when there is a leak or an electrical failure. The bypass conduit is also used in a venting procedure.
Public/Granted literature
- US20070017798A1 Evacuable magnetron chamber Public/Granted day:2007-01-25
Information query
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