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US08097341B2 Process for producing a wipe-proof antireflection layer on a borosilicate glass body 有权
在硼硅酸盐玻璃体上制造防擦拭抗反射层的方法

  • Patent Title: Process for producing a wipe-proof antireflection layer on a borosilicate glass body
  • Patent Title (中): 在硼硅酸盐玻璃体上制造防擦拭抗反射层的方法
  • Application No.: US12356946
    Application Date: 2009-01-21
  • Publication No.: US08097341B2
    Publication Date: 2012-01-17
  • Inventor: Stephan Tratzky , Denise Trapp
  • Applicant: Stephan Tratzky , Denise Trapp
  • Applicant Address: DE Mainz
  • Assignee: Schott AG
  • Current Assignee: Schott AG
  • Current Assignee Address: DE Mainz
  • Agent Michael J. Striker
  • Priority: DE102008006785 20080130
  • Main IPC: B32B17/06
  • IPC: B32B17/06
Process for producing a wipe-proof antireflection layer on a borosilicate glass body
Abstract:
A process for producing a wipe-proof anti-reflection layer on a borosilicate glass body is described, in which the borosilicate glass body is coated with a coating solution having a composition of 1-6% by weight of HCl, 0.5-7% by weight of SiO2 sol (solids content), 0.5-5% by weight of H2O, and 85-98% by weight of a readily volatile water-soluble organic solvent. The borosilicate glass body that is to be coated contains, in % by weight based on oxide content: 63-76 of SiO2, >11-20 of B2O3, 1-9 of Al2O3, 3-12 of alkali metal oxide(s), 0-10 of alkaline earth metal oxide(s), 0-2 of ZnO, 0-5 of TiO2, 0-1 of ZrO2, 0-1 of Nb2O5, and 0-1 of WO3.
Abstract(Chinese):

描述了在硼硅酸盐玻璃体上制造防擦拭抗反射层的方法，其中硼硅酸盐玻璃体涂覆有组成为1-6重量％的HCl的涂料溶液，0.5-7重量％ SiO 2溶胶的重量（固体含量），0.5-5重量％的H 2 O和85-98重量％的易挥发的水溶性有机溶剂。 待涂布的硼硅酸盐玻璃体含有以氧化物含量计的重量％：SiO 2的63-76，B 2 O 3的> 11-20，Al 2 O 3的1-9，碱金属氧化物的3-12， 0-10的碱土金属氧化物，0-2的ZnO，0-5的TiO 2，0-1的ZrO 2，0-1的Nb 2 O 5和0-1的WO 3。

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