Invention Grant
US08097396B2 Positive resist composition and method for forming resist pattern
有权
正型抗蚀剂组合物和形成抗蚀剂图案的方法
- Patent Title: Positive resist composition and method for forming resist pattern
- Patent Title (中): 正型抗蚀剂组合物和形成抗蚀剂图案的方法
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Application No.: US11597005Application Date: 2005-05-25
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Publication No.: US08097396B2Publication Date: 2012-01-17
- Inventor: Hiroaki Shimizu , Masaru Takeshita
- Applicant: Hiroaki Shimizu , Masaru Takeshita
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JPP2004-159421 20040528; JPP2004-322545 20041105
- International Application: PCT/JP2005/009564 WO 20050525
- International Announcement: WO2005/116769 WO 20051208
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/028 ; G03F7/039

Abstract:
A positive resist composition that includes a resin component (A) that exhibits increased alkali solubility under action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) is a copolymer (A1) that includes a structural unit (a1) derived from an acrylate that contains an acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an α-lower alkyl acrylate that contains a lactone ring, and a structural unit (a3) derived from an (α-lower alkyl)acrylate that contains a polar group-containing polycyclic group.
Public/Granted literature
- US20080063974A1 Positive Resist Composition and Method for Forming Resist Pattern Public/Granted day:2008-03-13
Information query
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