Invention Grant
- Patent Title: Method of manufacturing semiconductor light emitting elements
- Patent Title (中): 半导体发光元件的制造方法
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Application No.: US12917682Application Date: 2010-11-02
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Publication No.: US08097493B2Publication Date: 2012-01-17
- Inventor: Noriko Nihei , Tatsuma Saito , Yusuke Yokobayashi
- Applicant: Noriko Nihei , Tatsuma Saito , Yusuke Yokobayashi
- Applicant Address: JP Tokyo
- Assignee: Stanley Electric Co., Ltd.
- Current Assignee: Stanley Electric Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Holtz, Holtz, Goodman & Chick, PC
- Priority: JP2009-252902 20091104
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/50 ; H01L21/48 ; H01L21/44 ; H01L21/46 ; H01L21/30

Abstract:
A method of manufacturing semiconductor light emitting elements with improved yield and emission power uses laser lift-off and comprises the steps of forming a semiconductor grown layer formed of a first semiconductor layer, an active layer, and a second semiconductor layer on a first principal surface of a growth substrate; forming a plurality of junction electrodes apart on the second semiconductor layer and forming guide grooves arranged in a lattice to surround each of the junction electrodes in the second semiconductor layer; joining together a support and the semiconductor grown layer via the junction electrodes; projecting a laser to separate the growth substrate; dividing the semiconductor grown layer into respective element regions for the semiconductor light emitting elements; and cutting the support, thereby separating into the semiconductor light emitting elements. Removed regions include regions where the guide grooves are formed, and side walls of the second semiconductor layer formed by the guide grooves have a beveled shape at intersections of the guide grooves.
Public/Granted literature
- US20110104835A1 METHOD OF MANUFACTURING SEMICONDUCTOR LIGHT EMITTING ELEMENTS Public/Granted day:2011-05-05
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