Invention Grant
- Patent Title: Galvanic optocoupler and method of making
- Patent Title (中): 电光耦合器及其制作方法
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Application No.: US12019186Application Date: 2008-01-24
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Publication No.: US08097868B2Publication Date: 2012-01-17
- Inventor: Mariantonietta Monaco , Massimiliano Fiorito , Gianpiero Montalbano , Salvatore Coffa
- Applicant: Mariantonietta Monaco , Massimiliano Fiorito , Gianpiero Montalbano , Salvatore Coffa
- Applicant Address: IT Agrate Brianza
- Assignee: STMicroelectronics S.r.l.
- Current Assignee: STMicroelectronics S.r.l.
- Current Assignee Address: IT Agrate Brianza
- Agency: Seed IP Law Group PLLC
- Agent Lisa K. Jorgenson; E. Russell Tarleton
- Priority: ITMI07A0101 20070124
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A galvanic optocoupler of the type monolithically integrated on a silicon substrate and having at least one luminous source and a photodetector interfaced by means of a galvanic insulation layer. The photodetector can be a phototransistor realized in the silicon substrate, and the galvanic insulation layer (40) is a passivation layer of this phototransistor. The luminous source, above the galvanic insulation layer includes an integrated LED having a first and second polysilicon layer with function of cathode and anode, respectively, these first and second layers enclosing at least one light emitter layer, in particular a silicon oxide layer enriched with silicon (SRO). An integration process of a galvanic optocoupler thus made, in particular in BCD3s technology is provided.
Public/Granted literature
- US20080173879A1 GALVANIC OPTOCOUPLER AND METHOD OF MAKING Public/Granted day:2008-07-24
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