Invention Grant
- Patent Title: Group III nitride semiconductor light emitting device and method for producing the same
- Patent Title (中): III族氮化物半导体发光器件及其制造方法
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Application No.: US12223986Application Date: 2007-02-13
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Publication No.: US08097891B2Publication Date: 2012-01-17
- Inventor: Kenji Kasahara , Kazumasa Ueda , Yoshinobu Ono
- Applicant: Kenji Kasahara , Kazumasa Ueda , Yoshinobu Ono
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery
- Priority: JP2006-039067 20060216
- International Application: PCT/JP2007/052910 WO 20070213
- International Announcement: WO2007/094490 WO 20070823
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
The present invention provides a group III nitride semiconductor light emitting device and a method for producing the same. The group III nitride semiconductor light emitting device comprises (a1), (b1) and (c1) in this order: (a1) an N electrode, (b1) a semiconductor multi-layer film, (c1) a transparent electric conductive oxide P electrode, wherein the semiconductor multi-layer film comprises an N-type semiconductor layer, light emitting layer, P-type semiconductor layer and high concentration N-type semiconductor layer having an n-type impurity concentration of 5×1018 cm−3 to 5×1020 cm−3 in this order, the N-type semiconductor layer is in contact with the N electrode, and the semiconductor multi-layer film has a convex.
Public/Granted literature
- US20100155754A1 Group III Nitride Semiconductor Light Emitting Device and Method for Producing the Same Public/Granted day:2010-06-24
Information query
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