Etch stop structures for floating gate devices are generally described. In one example, a floating gate device includes a semiconductor substrate having a surface on which one or more floating gate devices are formed, a tunnel dielectric coupled with the surface of the semiconductor substrate, a floating gate structure coupled with the tunnel dielectric, the floating gate structure having a first surface, a second surface, and a third surface, wherein the third surface is substantially parallel with the surface of the semiconductor substrate and wherein the first surface is substantially parallel with the second surface and substantially perpendicular with the third surface, an etch stop film coupled with the third surface of the floating gate structure, and an inter-gate dielectric coupled with the first surface and the second surface of the floating gate structure wherein the inter-gate dielectric comprises a material that is less resistant to an etchant that removes material of a control gate structure than the etch stop film.