Invention Grant
US08097919B2 Mesa termination structures for power semiconductor devices including mesa step buffers
有权
用于功率半导体器件的Mesa端接结构,包括台面步进缓冲器
- Patent Title: Mesa termination structures for power semiconductor devices including mesa step buffers
- Patent Title (中): 用于功率半导体器件的Mesa端接结构,包括台面步进缓冲器
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Application No.: US12189551Application Date: 2008-08-11
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Publication No.: US08097919B2Publication Date: 2012-01-17
- Inventor: Qingchun Zhang , Anant K. Agarwal
- Applicant: Qingchun Zhang , Anant K. Agarwal
- Applicant Address: US NC Durham
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US NC Durham
- Agency: Myers Bigel Sibley & Sajovec
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
An electronic device includes a drift layer having a first conductivity type, a buffer layer having a second conductivity type, opposite the first conductivity type, on the drift layer and forming a P−N junction with the drift layer, and a junction termination extension region having the second conductivity type in the drift layer adjacent the P−N junction. The buffer layer includes a step portion that extends over a buried portion of the junction termination extension. Related methods are also disclosed.
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