Invention Grant
US08098012B2 Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel
失效
感光性组合物，包含该光敏组合物的隔壁用光敏糊剂组合物和等离子体显示面板用隔壁的制造方法
- Patent Title: Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel
- Patent Title (中): 感光性组合物，包含该光敏组合物的隔壁用光敏糊剂组合物和等离子体显示面板用隔壁的制造方法
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Application No.: US12461918Application Date: 2009-08-27
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Publication No.: US08098012B2Publication Date: 2012-01-17
- Inventor: Hyea-Weon Shin , Yon-Goo Park , Bong-Gi Kim , Chan-Seok Park , Sung-Mun Ryu
- Applicant: Hyea-Weon Shin , Yon-Goo Park , Bong-Gi Kim , Chan-Seok Park , Sung-Mun Ryu
- Applicant Address: KR Gongse-dong, Giheung-gu, Yongin-si, Gyeonggi-do
- Assignee: Samsung SDI Co., Ltd.
- Current Assignee: Samsung SDI Co., Ltd.
- Current Assignee Address: KR Gongse-dong, Giheung-gu, Yongin-si, Gyeonggi-do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2004-0099482 20041130
- Main IPC: H01J17/49
- IPC: H01J17/49 ; G03F7/00 ; G03F7/004
Abstract:
A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.
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