Invention Grant
US08098362B2 Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
有权
检测装置，移动体装置，图案形成装置和图案形成方法，曝光装置和曝光方法以及装置制造方法
- Patent Title: Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
- Patent Title (中): 检测装置，移动体装置，图案形成装置和图案形成方法，曝光装置和曝光方法以及装置制造方法
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Application No.: US12128036Application Date: 2008-05-28
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Publication No.: US08098362B2Publication Date: 2012-01-17
- Inventor: Yuho Kanaya
- Applicant: Yuho Kanaya
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
By irradiating a detection beam from an irradiation system of a detection device to a scale used for measuring the position of a wafer stage, and detecting the detection beam via the scale by a photodetection system, a surface state (an existence state of foreign substance) of the scale is detected. With this operation, detection of the surface state can be performed contactlessly with respect to the scale. Moreover, movement control of the wafer stage can be performed with high precision by taking the surface state into consideration.
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