Invention Grant
- Patent Title: Exposure apparatus and method for photolithography process
- Patent Title (中): 用于光刻工艺的曝光装置和方法
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Application No.: US11875471Application Date: 2007-10-19
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Publication No.: US08098364B2Publication Date: 2012-01-17
- Inventor: Vinvent Yu , Hsien-Cheng Wang , Hung-Chang Hsieh
- Applicant: Vinvent Yu , Hsien-Cheng Wang , Hung-Chang Hsieh
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G02F1/29
- IPC: G02F1/29 ; G03B27/32 ; G03B27/42 ; G03B27/52 ; G03B27/54 ; G03B27/72

Abstract:
Provided is an exposure apparatus including a variable focusing device. The variable focusing device may include a transparent membrane that may be deformed in the presence of an electric field. The deformation of the transparent membrane may allow the focus length of a radiation beam to be modified. In an embodiment, the variable focusing device may be modulated such that a radiation beam having a first focus length is provided for a first position on an exposure target and a radiation beam having a second focus length is provided for a second position on the exposure target. A method and computer-readable medium are also provided.
Public/Granted literature
- US20090103068A1 EXPOSURE APPARATUS AND METHOD FOR PHOTOLITHOGRAPHY PROCESS Public/Granted day:2009-04-23
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