Invention Grant
- Patent Title: Illumination optical system, exposure apparatus, and device manufacturing method
- Patent Title (中): 照明光学系统,曝光装置和装置制造方法
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Application No.: US11962774Application Date: 2007-12-21
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Publication No.: US08098365B2Publication Date: 2012-01-17
- Inventor: Takafumi Kawasaki
- Applicant: Takafumi Kawasaki
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2007-003091 20070111
- Main IPC: G03B27/54
- IPC: G03B27/54

Abstract:
An illumination optical system which illuminates a plane to be illuminated using light from a light source, includes a first integrator and a second integrator disposed in order from the light source, a diaphragm having an aperture of constant area and disposed between the first integrator and the second integrator and close to the first integrator and an irradiation range adjustment unit configured to adjust an irradiation range of the light from the light source on a plane where the diaphragm is disposed, the irradiation range includes the aperture.
Public/Granted literature
- US20080212061A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2008-09-04
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