Invention Grant
- Patent Title: Manufacturing method of thin-film magnetic head, wafer for thin-film magnetic head and thin-film magnetic head
- Patent Title (中): 薄膜磁头制造方法,薄膜磁头和薄膜磁头用晶片
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Application No.: US12361877Application Date: 2009-01-29
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Publication No.: US08098462B2Publication Date: 2012-01-17
- Inventor: Tetsuya Hiraki , Yoshiaki Tanaka , Yuji Otsubo , Sohei Horiuchi
- Applicant: Tetsuya Hiraki , Yoshiaki Tanaka , Yuji Otsubo , Sohei Horiuchi
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Frommer Lawrence & Haug LLP
- Main IPC: G11B5/33
- IPC: G11B5/33

Abstract:
A manufacturing method of a thin-film magnetic head, includes a step of forming many thin-film magnetic heads arranged along row and column directions on a wafer, each of the thin-film magnetic heads having a read head element, a write head element, and pairs of probe-use pads electrically connected with the read head element and the write head element, respectively, the pairs of probe-use pads being positioned so that at least part of each probe-use pad is removed by a cutting process along the row direction, a step of obtaining a plurality of row-bars by cutting the wafer along the row direction so that the at least part of each probe-use pad is removed, each of the obtained row-bars having the thin-film magnetic heads aligned in the row direction, a step of forming pairs of bonding pads electrically connected with the read head element and the write head element, respectively, on a surface opposite to an ABS of each thin-film magnetic head of each of the row-bars, and a step of cutting each row-bar along the column direction to separate into individual thin-film magnetic heads.
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