Invention Grant
- Patent Title: Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp
- Patent Title (中): 静电夹具，光刻设备及制造静电夹具的方法
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Application No.: US13069203Application Date: 2011-03-22
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Publication No.: US08098475B2Publication Date: 2012-01-17
- Inventor: Anko Jozef Cornelus Sijben
- Applicant: Anko Jozef Cornelus Sijben
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: H02N13/00
- IPC: H02N13/00
Abstract:
An electrostatic clamp for use in a lithographic apparatus includes a layer of material provided with burls, wherein an electrode surrounded by an insulator and or a dielectric material is provided in between the burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.
Public/Granted literature
- US20110170085A1 ELECTROSTATIC CLAMP, LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING AN ELECTROSTATIC CLAMP Public/Granted day:2011-07-14
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