Invention Grant
- Patent Title: Method and system for evaluating an evaluated pattern of a mask
- Patent Title (中): 用于评估掩模的评估图案的方法和系统
-
Application No.: US11971209Application Date: 2008-01-08
-
Publication No.: US08098926B2Publication Date: 2012-01-17
- Inventor: Ishai Schwarzband , Shmoolik Mangan , Chaim Braude , Michael Ben-Yishai , Gadi Greenberg
- Applicant: Ishai Schwarzband , Shmoolik Mangan , Chaim Braude , Michael Ben-Yishai , Gadi Greenberg
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel, Ltd.
- Current Assignee: Applied Materials Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: SNR Denton US LLP
- Main IPC: G06K9/00
- IPC: G06K9/00
Abstract:
A method, system and a computer program product for evaluating an evaluated pattern of a mask, the method includes: receiving multiple moments that represent an image of the evaluated pattern; wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.
Public/Granted literature
- US20080166038A1 METHOD AND SYSTEM FOR EVALUATING AN EVALUATED PATTERN OF A MASK Public/Granted day:2008-07-10
Information query
