Invention Grant
- Patent Title: Model based microdevice design layout correction
- Patent Title (中): 基于模型的微型设计布局校正
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Application No.: US12184089Application Date: 2008-07-31
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Publication No.: US08099685B2Publication Date: 2012-01-17
- Inventor: Marko P Chew , Yue Yang , Juan Andres Torres Robles
- Applicant: Marko P Chew , Yue Yang , Juan Andres Torres Robles
- Applicant Address: US OR Wilsonville
- Assignee: Mentor Graphics Corporation
- Current Assignee: Mentor Graphics Corporation
- Current Assignee Address: US OR Wilsonville
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
Shapes neighboring a potential manufacturing fault within a microdevice design layout are identified. Models are employed to determine the affect of the shapes upon the potential manufacturing fault. Possible adjustments to the shapes are modeled. The possible adjustments facilitating resolution of the potential manufacturing fault.
Public/Granted literature
- US20090113359A1 Model Based Microdevice Design Layout Correction Public/Granted day:2009-04-30
Information query
