Invention Grant
- Patent Title: Omnidirectional flat antenna and method of production
- Patent Title (中): 全方位平面天线及其制作方法
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Application No.: US11991425Application Date: 2006-09-22
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Publication No.: US08106845B2Publication Date: 2012-01-31
- Inventor: Olivier Savry
- Applicant: Olivier Savry
- Applicant Address: FR Paris
- Assignee: Commissariat a l'Energie Atomique
- Current Assignee: Commissariat a l'Energie Atomique
- Current Assignee Address: FR Paris
- Agency: Oliff & Berridge, PLC
- Priority: FR0509711 20050922
- International Application: PCT/FR2006/002173 WO 20060922
- International Announcement: WO2007/034087 WO 20070329
- Main IPC: H01Q7/08
- IPC: H01Q7/08

Abstract:
The inventive antenna comprises a planar substrate carrying as first winding whose axis is arranged in a parallel position to the plane of the substrate. Said antenna also comprises at least one second winding, whose axis is arranged in a parallel position to the plane of the substrate and which is wound-up about a thin layer made of high magnetically permeable material and arranged in a parallel position with respect to the plane of the substrate. A third winding, whose axis is perpendicular to the first and second windings and which is wound-up about an additional thin layer can be provided. Said additional thin layer is arranged in a parallel position to the plane of the substrate and is made of high magnetically permeable material.
Public/Granted literature
- US20100220025A1 Omnidirectional flat antenna and method of production Public/Granted day:2010-09-02
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