Invention Grant
- Patent Title: Method and apparatus for verifying two dimensional mark quality
- Patent Title (中): 用于验证二维标记质量的方法和装置
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Application No.: US11427420Application Date: 2006-06-29
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Publication No.: US08108176B2Publication Date: 2012-01-31
- Inventor: Sateesha Nadabar , Venkat K. Gopalakrishnan , Carl W. Gerst
- Applicant: Sateesha Nadabar , Venkat K. Gopalakrishnan , Carl W. Gerst
- Applicant Address: US MA Natick
- Assignee: Cognex Corporation
- Current Assignee: Cognex Corporation
- Current Assignee Address: US MA Natick
- Agent Michael A. Jaskolski
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
A method and system for applying a two dimensional mark on a first surface of a component and assessing mark quality, the method including the steps of positioning a component with a first surface at a first station, applying a two dimensional mark to the first surface at the first station wherein the applied mark is intended to codify a first information subset, obtaining an image of the applied two dimensional mark at the first station, performing a mark quality assessment on the obtained image and performing a secondary function as a result of the mark quality assessment.
Public/Granted literature
- US20080004822A1 Method and Apparatus for Verifying Two Dimensional Mark Quality Public/Granted day:2008-01-03
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