Invention Grant
- Patent Title: Short path customized mask correction
- Patent Title (中): 短路定制掩码校正
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Application No.: US12355814Application Date: 2009-01-19
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Publication No.: US08108804B2Publication Date: 2012-01-31
- Inventor: Ioana Graur , Scott M. Mansfield
- Applicant: Ioana Graur , Scott M. Mansfield
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Yuanmin Cai
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
Embodiments of the present invention provide a method of performing photo-mask correction. The method includes identifying a hot-spot in a photo-mask that violates one or more predefined rules; creating a window area in the photo-mask that surrounds the hot spot; categorizing the window area; selecting a solution, from a library of pre-computed solutions, based on a category of the window area; and applying the solution to the hot spot. A service-oriented architecture (SOA) system that synchronizes the design to the process is also provided.
Public/Granted literature
- US20100185999A1 SHORT PATH CUSTOMIZED MASK CORRECTION Public/Granted day:2010-07-22
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