Invention Grant
- Patent Title: Method for manufacturing a perpendicular magnetic write head
- Patent Title (中): 用于制造垂直磁写头的方法
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Application No.: US11934687Application Date: 2007-11-02
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Publication No.: US08108985B2Publication Date: 2012-02-07
- Inventor: Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
- Applicant: Yi Zheng , Yimin Hsu , Wen-Chien David Hsiao , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Edward Hin Pong Lee , Hung-Chin Guthrie , Ning Shi , Vladimir Nikitin , Prabodh Ratnaparkhi , Yinshi Liu
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: G11B5/127
- IPC: G11B5/127 ; H04R31/00

Abstract:
A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
Public/Granted literature
- US20090117407A1 SHORT FLARE DEFINITION BY ADDITIVE PROCESS FOR PERPENDICULAR HEAD Public/Granted day:2009-05-07
Information query
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