Invention Grant
- Patent Title: Method for manufacturing a perpendicular magnetic write pole having a large bevel angle
- Patent Title (中): 用于制造具有大斜角的垂直磁性写入极的方法
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Application No.: US11966164Application Date: 2007-12-28
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Publication No.: US08108986B2Publication Date: 2012-02-07
- Inventor: Yinshi Liu
- Applicant: Yinshi Liu
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: G11B5/127
- IPC: G11B5/127 ; H04R31/00

Abstract:
A method for manufacturing a magnetic write head for perpendicular magnetic recording, the write head having a write pole with an increased bevel (taper) angle. The write pole is constructed by forming a mask structure over a magnetic write pole material, and then performing a combination of sweeping or rotation with static (non-rotating, non-sweeping) ion milling at an angle relative to normal. The ion milling is performed while moving the wafer laterally within the ion milling tool to ensure that the ion milling is performed uniformly across the wafer during static milling.
Public/Granted literature
- US20090168242A1 METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE POLE HAVING A LARGE BEVEL ANGLE Public/Granted day:2009-07-02
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