Invention Grant
- Patent Title: Method for drying applied film and drying apparatus
- Patent Title (中): 干燥涂膜及干燥装置的方法
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Application No.: US11861808Application Date: 2007-09-26
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Publication No.: US08109010B2Publication Date: 2012-02-07
- Inventor: Nobuo Hamamoto
- Applicant: Nobuo Hamamoto
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-261389 20060926
- Main IPC: F26B11/03
- IPC: F26B11/03

Abstract:
The present invention provides a method for drying an applied film formed by applying an application liquid containing an organic solvent to a traveling long support medium, wherein the temperature Tb of the long support medium before application is not less than 2° C. lower than the temperature Tc of the application liquid and the wind velocity in the vicinity of the applied film after application is not more than 0.5 m/s, thereby the applied film is dried uniformly in the initial drying of the applied film.
Public/Granted literature
- US20080075867A1 METHOD FOR DRYING APPLIED FILM AND DRYING APPARATUS Public/Granted day:2008-03-27
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