Invention Grant
- Patent Title: Liquid ejection apparatus and method of inspecting cleaning apparatus of liquid ejection apparatus
- Patent Title (中): 液体喷射装置及检查液体喷射装置的清洁装置的方法
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Application No.: US12142576Application Date: 2008-06-19
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Publication No.: US08109599B2Publication Date: 2012-02-07
- Inventor: Hiroshi Inoue
- Applicant: Hiroshi Inoue
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2007-162678 20070620
- Main IPC: B41J2/165
- IPC: B41J2/165

Abstract:
The liquid ejection apparatus has: a liquid ejection head which includes a nozzle plate forming a nozzle surface in which nozzles ejecting droplets of a first liquid are provided; a wiping member which wipes the nozzle surface; an edge determination device which includes a determination plate with which a front tip portion of the wiping member wiping the nozzle surface can make contact, and determines an edge shape of the front tip portion of the wiping member according to a state of the determination plate; and a judgment device which judges timing of replacing the wiping member, according to the edge shape determined by the edge determination device.
Public/Granted literature
- US20080316253A1 LIQUID EJECTION APPARATUS AND METHOD OF INSPECTING CLEANING APPARATUS OF LIQUID EJECTION APPARATUS Public/Granted day:2008-12-25
Information query
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