Invention Grant
- Patent Title: Double-sided nano-imprint lithography system
- Patent Title (中): 双面纳米压印光刻系统
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Application No.: US12684538Application Date: 2010-01-08
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Publication No.: US08109753B2Publication Date: 2012-02-07
- Inventor: Byung-Jin Choi , Sidlgata V. Sreenivasan
- Applicant: Byung-Jin Choi , Sidlgata V. Sreenivasan
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: B29C59/00
- IPC: B29C59/00 ; B28B17/00
Abstract:
A nano-imprint lithography system is described for patterning first and second substrates, the system includes a translation stage constructed to alternatively place substrate chucks in position with respect to a nano-imprint mold assembly such that the nano-imprint mold assembly may imprint a pattern on one of the substrates, while concurrently obtaining a desired spatial relationship for the remaining substrate.
Public/Granted literature
- US20100112116A1 Double-Sided Nano-Imprint Lithography System Public/Granted day:2010-05-06
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