Invention Grant
- Patent Title: Method for manufacturing single crystal
- Patent Title (中): 单晶制造方法
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Application No.: US12515730Application Date: 2008-05-07
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Publication No.: US08110042B2Publication Date: 2012-02-07
- Inventor: Yasuhito Narushima , Shinichi Kawazoe , Fukuo Ogawa , Tsuneaki Tomonaga , Yasuyuki Ohta , Toshimichi Kubota , Shinsuke Nishihara
- Applicant: Yasuhito Narushima , Shinichi Kawazoe , Fukuo Ogawa , Tsuneaki Tomonaga , Yasuyuki Ohta , Toshimichi Kubota , Shinsuke Nishihara
- Applicant Address: JP Omura-shi
- Assignee: Sumco Techxiv Corporation
- Current Assignee: Sumco Techxiv Corporation
- Current Assignee Address: JP Omura-shi
- Agency: Holtz, Holtz, Goodman & Chick, PC
- Priority: JP2007-125848 20070510
- International Application: PCT/JP2008/058483 WO 20080507
- International Announcement: WO2008/142993 WO 20081127
- Main IPC: C30B15/20
- IPC: C30B15/20 ; C30B15/02 ; C30B15/04

Abstract:
Using a pulling-up apparatus, an oxygen concentration of the monocrystal at a predetermined position in a pulling-up direction is controlled based on a relationship in which the oxygen concentration of the monocrystal is decreased as a flow rate of the inactive gas at a position directly above a free surface of the dopant-added melt is increased when the monocrystal is manufactured with a gas flow volume in the chamber being in the range of 40 L/min to 400 L/min and an inner pressure in the chamber being in the range of 5332 Pa to 79980 Pa. Based on the relationship, oxygen concentration is elevated to manufacture the monocrystal having a desirable oxygen concentration. Because the oxygen concentration is controlled under a condition corresponding to a condition where the gas flow rate is rather slow, the difference between a desirable oxygen concentration profile of the monocrystal and an actual oxygen concentration profile is reduced.
Public/Granted literature
- US20100050931A1 METHOD FOR MANUFACTURING SINGLE CRYSTAL Public/Granted day:2010-03-04
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