Invention Grant
- Patent Title: Mask, method of manufacturing mask, device for manufacturing mask, method of manufacturing layer of luminescent material, electro-optical device, and electronic device
- Patent Title (中): 掩模，掩模制造方法，掩模制造装置，发光材料层制造方法，电光装置和电子装置
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Application No.: US12591893Application Date: 2009-12-03
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Publication No.: US08110063B2Publication Date: 2012-02-07
- Inventor: Makoto Nakadate
- Applicant: Makoto Nakadate
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-061355 20030307; JP2003-061356 20030307; JP2003-061357 20030307; JP2004-036621 20040213
- Main IPC: B32B37/12
- IPC: B32B37/12
Abstract:
This mask includes: a substrate in which an aperture is formed; a mask member which, along with being formed with a plurality of through holes, is joined to the substrate in correspondence to the aperture; and spacers which hold the substrate and the mask member with a predetermined gap between them.
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