Invention Grant
US08110085B2 Assisted deposition, narrow trench damascene process for manufacturing a write pole of a magnetic write head 有权
辅助沉积,窄沟槽镶嵌工艺,用于制造磁头写磁头

Assisted deposition, narrow trench damascene process for manufacturing a write pole of a magnetic write head
Abstract:
A method for forming a magnetic write head using a damascene process that does not form voids in the magnetic structure. An opening is formed in an alumina layer, the opening being configured to define a trench. Then a first layer of magnetic material is deposited into the trench. A CMP process is then performed to remove any voids that have formed in the first magnetic layer. Then a second layer of magnetic material is deposited over the first layer of magnetic material. In another embodiment of the invention, a opening is formed in the alumina layer, and a first layer of magnetic material is electroplated into the opening. A thin layer of non-magnetic material is then deposited, and a second layer of magnetic material is deposited over the thin layer of non-magnetic material. The thin layer of alumina advantageously provides a laminate structure that avoids data erasure.
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