Invention Grant
- Patent Title: Method for producing a thin-film solar cell by use of microcrystalline silicon and a layer sequence
- Patent Title (中): 通过使用微晶硅和层序来制造薄膜太阳能电池的方法
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Application No.: US11793690Application Date: 2005-12-13
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Publication No.: US08110246B2Publication Date: 2012-02-07
- Inventor: Stefan Klein , Yaohua Mai , Friedhelm Finger , Reinhard Carius
- Applicant: Stefan Klein , Yaohua Mai , Friedhelm Finger , Reinhard Carius
- Applicant Address: DE Julich
- Assignee: Forschungszentrum Julich GmbH
- Current Assignee: Forschungszentrum Julich GmbH
- Current Assignee Address: DE Julich
- Agent Jonathan Myers; Andrew Wilford
- Priority: DE102004061360 20041221
- International Application: PCT/DE2005/002237 WO 20051213
- International Announcement: WO2006/066544 WO 20060629
- Main IPC: H01L31/028
- IPC: H01L31/028
Abstract:
The invention relates to a method for production of a thin-layer solar cell with microcrystalline silicon and a layer sequence. According to the invention, a microcrystalline silicon layer is applied to the lower p- or n-layer in pin or nip thin-layer solar cells, by means of a HWCVD method before the application of the microcrystalline i-layer. The efficiency of the solar cell is hence increased by up to 0.8% absolute.
Public/Granted literature
- US20090007964A1 Method for producing a thin-film solar cell by use of microcrystalline silicon and a layer sequence Public/Granted day:2009-01-08
Information query
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