Invention Grant
- Patent Title: Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials
- Patent Title (中): 用于感热中等尺度沉积氧敏感材料的激光加工
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Application No.: US11430636Application Date: 2006-05-08
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Publication No.: US08110247B2Publication Date: 2012-02-07
- Inventor: Michael J. Renn , Bruce H. King , Marcelino Essien , Manampathy G. Giridharan , Jyh-Cherng Sheu
- Applicant: Michael J. Renn , Bruce H. King , Marcelino Essien , Manampathy G. Giridharan , Jyh-Cherng Sheu
- Applicant Address: US NM Albuquerque
- Assignee: Optomec Design Company
- Current Assignee: Optomec Design Company
- Current Assignee Address: US NM Albuquerque
- Agency: Peacock Myers, P.C.
- Agent Philip D. Askenazy
- Main IPC: B41J2/015
- IPC: B41J2/015

Abstract:
A method of depositing various materials onto heat-sensitive targets, particularly oxygen-sensitive materials. Heat-sensitive targets are generally defined as targets that have thermal damage thresholds that are lower than the temperature required to process a deposited material. The invention uses precursor solutions and/or particle or colloidal suspensions, along with optional pre-deposition treatment and/or post-deposition treatment to lower the laser power required to drive the deposit to its final state. The present invention uses Maskless Mesoscale Material Deposition (M3D™) to perform direct deposition of material onto the target in a precise, highly localized fashion. Features with linewidths as small as 4 microns may be deposited, with little or no material waste. A laser is preferably used to heat the material to process it to obtain the desired state, for example by chemical decomposition, sintering, polymerization, and the like. This laser processing may be performed in an ambient environment with laser powers of less than 100 milliwatts. Cover gases and/or forming gases may be used during thermal processing to change the material properties, for example by preventing oxidation.
Public/Granted literature
- US20070019028A1 Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials Public/Granted day:2007-01-25
Information query
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