Invention Grant
- Patent Title: Resin and chemically amplified resist composition comprising the same
- Patent Title (中): 树脂和化学增幅抗蚀剂组合物
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Application No.: US12562943Application Date: 2009-09-18
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Publication No.: US08110336B2Publication Date: 2012-02-07
- Inventor: Ichiki Takemoto , Nobuo Ando
- Applicant: Ichiki Takemoto , Nobuo Ando
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Hogan Lovells US LLP
- Priority: JP2008-243840 20080924
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/38 ; C08F12/30
Abstract:
A resin comprising a structural unit represented by the formula (I): wherein Q1 and Q2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O— etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion.
Public/Granted literature
- US20100075257A1 Resin and Chemically Amplified Resist Composition Comprising the Same Public/Granted day:2010-03-25
Information query
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