Invention Grant
- Patent Title: Metal photoetching product and production method thereof
- Patent Title (中): 金属光刻产品及其制备方法
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Application No.: US12292759Application Date: 2008-11-25
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Publication No.: US08110344B2Publication Date: 2012-02-07
- Inventor: Ryuji Ueda , Satoshi Tanaka , Osamu Koga , Fusao Takagi , Hiroshi Matsuzawa , Yusuke Onoda , Shingo Akao
- Applicant: Ryuji Ueda , Satoshi Tanaka , Osamu Koga , Fusao Takagi , Hiroshi Matsuzawa , Yusuke Onoda , Shingo Akao
- Applicant Address: JP Tokyo
- Assignee: Toppan Printing Co., Ltd.
- Current Assignee: Toppan Printing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Priority: JPP2003-009237 20030117
- Main IPC: C03C25/68
- IPC: C03C25/68 ; G03F7/20
Abstract:
A metal photoetching product comprising at least one large cavity of minor axis W1S, major axis W1L and depth D1 in a surface of the product, wherein one or more cavities are included inside at least one of the at least one large cavity, and a smallest hole among the cavities has minor axis of W2S, major axis W2L, and depth D2; and the product satisfies the following dimensions, D1+D2=plate thickness D, 0.02 mm≦D≦2 mm, 0.4×D
Public/Granted literature
- US20090081596A1 Metal photoetching product and production method thereof Public/Granted day:2009-03-26
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