Invention Grant
- Patent Title: Manufacturing method of semiconductor laser element
- Patent Title (中): 半导体激光元件的制造方法
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Application No.: US12676666Application Date: 2008-09-02
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Publication No.: US08110422B2Publication Date: 2012-02-07
- Inventor: Masayoshi Kumagai , Kenshi Fukumitsu , Koji Kuno
- Applicant: Masayoshi Kumagai , Kenshi Fukumitsu , Koji Kuno
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: Hamamatsu Photonics K.K.
- Current Assignee: Hamamatsu Photonics K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JPP2007-231956 20070906
- International Application: PCT/JP2008/065760 WO 20080902
- International Announcement: WO2009/031534 WO 20090312
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Starting point regions for cutting 8a, 8b extending along lines to cut 5a, 5b are initially formed in an object to be processed 1. The starting point regions for cutting 8b have modified regions 7b formed by irradiating the object 1 with laser light while locating a converging point within the object 1 and are formed in parts extending along the lines to cut 5b excluding portions 34b intersecting the lines to cut 5a. This makes the starting point regions for cutting 8b much less influential when cutting the object 1 from the starting point regions for cutting 8a acting as a start point, whereby bars with precise cleavage surfaces can reliably be obtained. Therefore, it is unnecessary to form a starting point region for cutting along the lines to cut 5b in each of a plurality of bars, whereby the productivity of semiconductor laser elements can be improved.
Public/Granted literature
- US20100240159A1 MANUFACTURING METHOD OF SEMICONDUCTOR LASER ELEMENT Public/Granted day:2010-09-23
Information query
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