Invention Grant
- Patent Title: Method for manufacturing light emitting device
- Patent Title (中): 发光装置的制造方法
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Application No.: US12544353Application Date: 2009-08-20
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Publication No.: US08110451B2Publication Date: 2012-02-07
- Inventor: Yasuhiko Akaike , Ryo Saeki , Yoshinori Natsume
- Applicant: Yasuhiko Akaike , Ryo Saeki , Yoshinori Natsume
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Turocy & Watson, LLP
- Priority: JP2009-028908 20090210
- Main IPC: H01L21/335
- IPC: H01L21/335

Abstract:
A method for manufacturing a light emitting device, includes: forming a first multilayer body including a first substrate, a first semiconductor layer provided on the first substrate and having a light emitting layer, and a first metal layer provided on the first semiconductor layer; forming a second multilayer body including a second substrate having a thermal expansion coefficient different from a thermal expansion coefficient of the first substrate, and a second metal layer provided on the second substrate; a first bonding step configured to heat the first metal layer and the second metal layer being in contact with each other; removing the first substrate after the first bonding step; and a second bonding step configured to perform, after the removing, heating at a temperature higher than a temperature of the first bonding step.
Public/Granted literature
- US20100203659A1 METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE Public/Granted day:2010-08-12
Information query
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