Invention Grant
- Patent Title: Method for making a self aligning memory device
- Patent Title (中): 制造自对准存储器件的方法
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Application No.: US12964653Application Date: 2010-12-09
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Publication No.: US08110456B2Publication Date: 2012-02-07
- Inventor: Hsiang-Lan Lung
- Applicant: Hsiang-Lan Lung
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Main IPC: H01L21/338
- IPC: H01L21/338

Abstract:
A self aligning memory device, with a memory element switchable between electrical property states by the application of energy, includes a substrate and word lines, at least the sides of the word lines covered with a dielectric material which defines gaps. An access device within a substrate has a first terminal under a second gap and second terminals under first and third gaps. First and second source lines are in the first and third gaps and are electrically connected to the second terminals. A first electrode in the second gap is electrically connected to the first terminal. A memory element in the second gap is positioned over and electrically connected to the first electrode. A second electrode is positioned over and contacts the memory element. The first contact, the first electrode, the memory element and the second electrode are self aligning. A portion of the memory element may have a sub lithographically dimensioned width.
Public/Granted literature
- US20110076825A1 Method for Making a Self Aligning Memory Device Public/Granted day:2011-03-31
Information query
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